Hiroki DATE

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2012-10-11

Top Assignees for applications by Hiroki DATE

The entities that hold a legal rights for patent applications filed by inventor DATE Hiroki:

Hiroki DATE from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

METHOD AND APPARATUS FOR SELECTIVELY GROWING DOPED EPITAXIAL FILM

Method for reducing agglomeration of Si layer, method for manufacturing semiconductor device and vacuum treatment apparatus

Method of fabricating a semiconductor device

InventorID:

3274171 ⎘