Poughkeepsie, New York
United States
8
2012-11-08
The entities that hold a legal rights for patent applications filed by inventor Lisi Anthony D.:
Anthony D. Lisi from Poughkeepsie, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Air gap-containing interconnect structure having photo-patternable low k material
#2 | 2011-11-10Method for air gap interconnect integration using photo-patternable low k material
#3 | 2011-10-27Structures and methods for air gap integration
#4 | 2011-09-15Methods for fabrication of an air gap-containing interconnect structure
#5 | 2011-07-14PROCESS CONTROL USING SIGNAL REPRESENTATIVE OF A THROTTLE VALVE POSITION
#6 | 2009-11-19DAMASCENE WIRING FABRICATION METHODS INCORPORATING DIELECTRIC CAP ETCH PROCESS WITH HARD MASK RETENTION
#7 | 2009-08-13Sub-lithographic dimensioned air gap formation and related structure
#8 | 2008-12-30Damascene wiring fabrication methods incorporating dielectric cap etch process with hard mask retention
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