Tetsuya Abe

City:

Sagamihara-shi

Country:

Japan

Published Applications:

Last publication date:

2012-11-29

Top Assignees for applications by Tetsuya Abe

The entities that hold a legal rights for patent applications filed by inventor Abe Tetsuya:

NIKON CORPORATION 2 Tokyo, Japan

Recent patent applications by Abe Tetsuya

Tetsuya Abe from Sagamihara-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2012-11-29

US20120297833A1

Physics

Method of molding synthetic silica glass molded body

#2 | 2010-03-11

US20100062350A1

Physics

Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask

InventorID:

3301351 ⎘