Santa Clara, California
United States
22
2014-03-18
The entities that hold a legal rights for patent applications filed by inventor Li Lumin:
Lumin Li from Santa Clara, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Apparatus and method for controlling etch uniformity
#2 | 2011-02-03Apparatus and Method for Controlling Plasma Potential
#3 | 2011-02-03Apparatus and method for controlling plasma potential
#4 | 2010-05-27Apparatus and method for controlling plasma density profile
#5 | 2010-05-20Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
#6 | 2009-08-27Double mask self-aligned double patterning technology (SADPT) process
#7 | 2009-07-09Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same
#8 | 2009-02-12Magnetic enhancement for mechanical confinement of plasma
#9 | 2008-07-17Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
#10 | 2008-01-10Apparatus and Method for Controlling Plasma Potential
#11 | 2007-08-09Reducing line edge roughness
#12 | 2007-06-21Apparatus and method for controlling plasma density profile
#13 | 2007-04-05Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same
#14 | 2007-03-01Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
#15 | 2007-02-01Method for plasma etching performance enhancement
#16 | 2007-01-30Method for forming a dual damascene structure
#17 | 2007-01-18High aspect ratio etch using modulation of RF powers of various frequencies
#18 | 2006-09-12Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
#19 | 2006-06-08High aspect ratio etch using modulation of RF powers of various frequencies
#20 | 2006-01-10Plasma processor in plasma confinement region within a vacuum chamber
#21 | 2005-02-17Method for plasma etching performance enhancement
#22 | 2005-01-13Magnetic enhancement for mechanical confinement of plasma
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