Webster, New York
United States
21
2011-02-03
The entities that hold a legal rights for patent applications filed by inventor Ma Lin:
Lin Ma from Webster, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Fluoroelastomer containing intermediate transfer members
#2 | 2011-02-03Polyhedral silsesquioxane modified polyimide containing intermediate transfer members
#3 | 2010-12-30Fluorinated nano diamond anticurl backside coating (ACBC) photoconductors
#4 | 2010-12-09Hydrophobic coatings and their processes
#5 | 2010-11-04Core shell hydrophobic intermediate transfer components
#6 | 2010-07-29Nano diamond anticurl backside coating (ACBC) photoconductors
#7 | 2009-12-03Backing layer containing photoconductor
#8 | 2009-08-20Anticurl backside coating (ACBC) photoconductors
#9 | 2009-08-20Backing layer containing photoconductor
#10 | 2009-08-20Overcoat containing fluorinated poly(oxetane) photoconductors
#11 | 2008-12-18Hole blocking layer containing photoconductors
#12 | 2008-12-11Photoconductors containing fillers in the charge transport
#13 | 2008-12-11Photoconductors containing fillers
#14 | 2008-12-11Single layered photoconductors containing needle shaped particles
#15 | 2008-12-04Photoreceptors
#16 | 2008-10-02Anticurl backside coating (ACBC) photoconductors
#17 | 2008-09-25Methods and systems for evaluating pigment dispersions
#18 | 2008-09-25Photoconductor containing fluoroalkyl ester charge transport layers
#19 | 2008-09-25Overcoated photoconductors containing fluorinated esters
#20 | 2008-09-25Photoconductors containing fluorinated components
#21 | 2008-09-11Hole blocking layer containing photoconductors
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