Mitsuhiro Hata

City:

Delmar, New York

Country:

United States

Published Applications:

Last publication date:

2011-08-04

Top Assignees for applications by Mitsuhiro Hata

The entities that hold a legal rights for patent applications filed by inventor Hata Mitsuhiro:

SUMITOMO CHEMICAL COMPANY, LIMITED 7 Tokyo, Japan
SUMITOMO CHEMICHAL COMPANY, LIMITED 1 Tokyo, Japan

Recent patent applications by Hata Mitsuhiro

Mitsuhiro Hata from Delmar, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2011-08-04

US20110189618A1

Physics

RESIST PROCESSING METHOD

#2 | 2011-07-28

US20110183264A1

Physics

RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION

#3 | 2011-07-14

US20110171586A1

Physics

RESIST PROCESSING METHOD

#4 | 2011-07-07

US20110165521A1

Physics

PROCESS FOR PRODUCING PHOTORESIST PATTERN

#5 | 2011-05-26

US20110123926A1

Physics

Photoresist composition

#6 | 2011-04-21

US20110091820A1

Physics

RESIST PROCESSING METHOD

#7 | 2011-04-21

US20110091818A1

Physics

PROCESS FOR PRODUCING PHOTORESIST PATTERN

#8 | 2011-03-17

US20110065047A1

Chemistry; metallurgy

PHOTORESIST COMPOSITION

#9 | 2011-03-17

US20110065040A1

Chemistry; metallurgy

Photoresist composition

InventorID:

3358063 ⎘