Michael P.C. Watts

Low-K dielectric functional imprinting materials

Composition for an Etching Mask Comprising a Silicon-Containing Material

Step and repeat imprint lithography processes

Forming a layer on a substrate

Imprint Fluid Control

Composition for an etching mask comprising a silicon-containing material

Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor

Method for controlling distribution of fluid components on a body

Bifurcated contact printing technique

Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition

Imprint lithography substrate processing tool for modulating shapes of substrates

Scatterometry alignment for imprint lithography

Method to improve the flow rate of imprinting material employing an absorption layer

Method of forming a compliant template for UV imprinting

Step and repeat imprint lithography systems

Step and repeat imprint lithography processes

Displays and method for fabricating displays

Compliant hard template for UV imprinting

Method of forming a deep-featured template employed in imprint lithography

Composition for an etching mask comprising a silicon-containing material

Materials for imprint lithography

Method and system to measure characteristics of a film disposed on a substrate

Thermal processing system for imprint lithography

Method to improve the flow rate of imprinting material

Methods for fabricating patterned features utilizing imprint lithography

System for creating a turbulent flow of fluid between a mold and a substrate

Method of creating a turbulent flow of fluid between a mold and a substrate

Single phase fluid imprint lithography method

Capillary imprinting technique