Goetz TESCHNER

City:

Dresden

Country:

Germany

Published Applications:

Last publication date:

2011-07-28

Top Assignees for applications by Goetz TESCHNER

The entities that hold a legal rights for patent applications filed by inventor TESCHNER Goetz:

Goetz TESCHNER from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

REDUNDANT ANODE SPUTTERING METHOD

Supporting device for a magnetron assembly with a rotatable target

Method and arrangement for redundant anode sputtering having a dual anode arrangement

Endblock for a magnetron device with a rotatable target

Redundant anode sputtering method and assembly

Supply end block for rotary magnetron

POWER SUPPLY DEVICE

COOLABLE CARRIER PLATE FOR TARGETS IN VACUUM ATOMIZATION SYSTEMS

InventorID:

3406737 ⎘