Hsinchu
Taiwan
6
2014-04-17
The entities that hold a legal rights for patent applications filed by inventor Wang Haiting:
Haiting Wang from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
Lightly doped source/drain last method for dual-epi integration
#2 | 2013-12-19Gate structure having lightly doped region
#3 | 2011-12-01Multi-strained source/drain structures
#4 | 2011-09-15Method for fabricating a gate structure
#5 | 2011-08-11Lightly doped source/drain last method for dual-epi integration
#6 | 2011-06-23Dummy structure for isolating devices in integrated circuits
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