Tokyo
Japan
6
2011-08-04
The entities that hold a legal rights for patent applications filed by inventor Mita Juro:
Juro Mita from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of manufacturing field effect transistor having Ohmic electrode in a recess
#2 | 2008-10-02Etching structure
#3 | 2008-07-24Method for fabricating AIGaN/GaN-HEMT using selective regrowth
#4 | 2007-03-08Field effect transistor having Ohmic electrode in a recess
#5 | 2007-03-01Etching method, method of fabricating metal film structure, and etching structure
#6 | 2006-09-28Wafer for semiconductor device fabrication, method of manufacture of same, and field effect transistor
3427562 ⎘