Austin, Texas
United States
39
2013-01-08
The entities that hold a legal rights for patent applications filed by inventor Watts Michael P. C.:
Michael P. C. Watts from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method to arrange features on a substrate to replicate features having minimal dimensional variability
#2 | 2011-10-20Low-K dielectric functional imprinting materials
#3 | 2011-09-15Step and repeat imprint lithography process
#4 | 2010-08-12Step and repeat imprint lithography processes
#5 | 2010-07-22Forming a layer on a substrate
#6 | 2008-04-24Composition for an etching mask comprising a silicon-containing material
#7 | 2008-04-10Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
#8 | 2007-08-07System for dispensing liquids
#9 | 2007-06-21Method for controlling distribution of fluid components on a body
#10 | 2007-06-07Bifurcated contact printing technique
#11 | 2007-01-02Method to reduce adhesion between a conformable region and a pattern of a mold
#12 | 2006-11-30Imprint lithography template having a coating to reflect and/or absorb actinic energy
#13 | 2006-08-10Imprint lithography substrate processing tool for modulating shapes of substrates
#14 | 2006-07-20Scatterometry alignment for imprint lithography
#15 | 2006-07-18Step and repeat imprint lithography processes
#16 | 2006-07-04Method for fabricating bulbous-shaped vias
#17 | 2006-07-04Alignment systems for imprint lithography
#18 | 2006-05-11Method of forming a compliant template for UV imprinting
#19 | 2006-04-20Low-k dielectric functional imprinting materials
#20 | 2006-04-13Step and repeat imprint lithography processes
#21 | 2006-04-11Scatterometry alignment for imprint lithography
#22 | 2006-03-28Chucking system for modulating shapes of substrates
#23 | 2006-03-23Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
#24 | 2006-03-23Formation of discontinuous films during an imprint lithography process
#25 | 2006-02-16Method to provide a layer with uniform etch characteristics
#26 | 2006-01-03Chucking system for modulating shapes of substrates
#27 | 2005-12-27Method for modulating shapes of substrates
#28 | 2005-10-27Compliant hard template for UV imprinting
#29 | 2005-09-01Composition for an etching mask comprising a silicon-containing material
#30 | 2005-08-30Functional patterning material for imprint lithography processes
#31 | 2005-08-25Materials for imprint lithography
#32 | 2005-08-25Method and system to measure characteristics of a film disposed on a substrate
#33 | 2005-08-23Formation of discontinuous films during an imprint lithography process
#34 | 2005-08-09System and method for dispensing liquids
#35 | 2005-07-12Alignment methods for imprint lithography
#36 | 2005-05-31Step and repeat imprint lithography systems
#37 | 2005-05-12Methods for fabricating patterned features utilizing imprint lithography
#38 | 2005-04-07Single phase fluid imprint lithography method
#39 | 2005-03-24Capillary imprinting technique
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