Tokyo
Japan
12
2011-10-20
The entities that hold a legal rights for patent applications filed by inventor WICKRAMANAYAKA Sunil:
Sunil WICKRAMANAYAKA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Angled sputtering physical vapor deposition apparatus with wafer holder and wafer holder for an angled sputtering physical vapor deposition apparatus
#2 | 2009-09-03SPUTTERING APPARATUS FOR DEPOSITING A HIGHER PERMITTIVITY DIELECTRIC FILM
#3 | 2009-08-06MULTI-CATHODE IONIZED PHYSICAL VAPOR DEPOSITION SYSTEM
#4 | 2009-08-06MULTI-CATHODE IONIZED PHYSICAL VAPOR DEPOSITION SYSTEM
#5 | 2009-07-16MULTI-CATHODE IONIZED PHYSICAL VAPOR DEPOSITION SYSTEM
#6 | 2009-07-16METHOD OF SPUTTERING A HIGH-K DIELECTRIC MATERIAL
#7 | 2006-12-14Wafer Holder And Method Of Holding A Wafer
#8 | 2005-12-08Method of depositing a higher permittivity dielectric film
#9 | 2005-08-25Wafer stage with a magnet
#10 | 2005-07-14Plasma-assisted sputter deposition system
#11 | 2005-06-02Multi-cathode ionized physical vapor deposition system
#12 | 2005-02-10Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
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