Maxim LISACHENKO

City:

Suwon-si

Country:

South Korea

Published Applications:

Last publication date:

2011-10-27

Top Assignees for applications by Maxim LISACHENKO

The entities that hold a legal rights for patent applications filed by inventor LISACHENKO Maxim:

Maxim LISACHENKO from Suwon-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same

METHOD OF FORMING POLYCRYSTALLINE SILICON LAYER

Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the thin film transistor

InventorID:

3463556 ⎘