Mitsuhiro Hata

City:

Osaka

Country:

Japan

Published Applications:

Last publication date:

2011-02-17

Top Assignees for applications by Mitsuhiro Hata

The entities that hold a legal rights for patent applications filed by inventor Hata Mitsuhiro:

Mitsuhiro Hata from Osaka, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Compound and photoresist composition containing the same

PHOTORESIST COMPOSITION CONTAINING THE SAME

RESIST PROCESSING METHOD

PROCESS FOR PRODUCING PHOTORESIST PATTERN

Compound, method for preparing the compound and resist composition containing the compound

Polymer and chemically amplified resist composition comprising the same

Polymer and chemically amplified resist composition comprising the same

Chemically amplified resist composition and chemically amplified resist composition for immersion lithography

InventorID:

3518827 ⎘