Oberkochen
Germany
25
2025-02-27
The entities that hold a legal rights for patent applications filed by inventor Schneider Sonja:
Sonja Schneider from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH
#2 | 2023-05-04OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR OPERATING AN OPTICAL ELEMENT
#3 | 2021-11-25Optical element having a coating for influencing heating radiation and optical arrangement
#4 | 2021-11-11Projection exposure system for semiconductor lithography having an optical arrangement
#5 | 2019-12-12Optical element having a coating for influencing heating radiation and optical arrangement
#6 | 2018-12-20Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
#7 | 2018-05-17PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
#8 | 2018-03-22Projection lens with wave front manipulator and related method and apparatus
#9 | 2017-09-14Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element
#10 | 2017-06-15Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
#11 | 2017-05-04Optical element having a coating for influencing heating radiation and optical arrangement
#12 | 2017-04-27Projection exposure apparatus including at least one mirror
#13 | 2016-07-21Projection exposure method and projection exposure apparatus for microlithography
#14 | 2016-06-09MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHOD FOR PROCESSING A MIRROR
#15 | 2016-06-09Method of operating a microlithographic projection apparatus
#16 | 2016-03-31Optical assembly
#17 | 2016-01-14Microlithographic apparatus
#18 | 2015-06-18Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
#19 | 2015-06-11System correction from long timescales
#20 | 2015-04-30Reflective optical element
#21 | 2014-11-27Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
#22 | 2014-08-28Illumination and displacement device for a projection exposure apparatus
#23 | 2014-07-03Projection objective of a microlithographic projection exposure apparatus
#24 | 2013-07-25Imaging optical system for microlithography
#25 | 2010-08-05Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
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