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Inventor profile of:

Haruo YODA

City:

Hinode

Country:

Japan

Published Applications:

Last publication date:

2011-09-01

Top Assignees for applications by Haruo YODA

The entities that hold a legal rights for patent applications filed by inventor YODA Haruo:

HITACHI HIGH-TECHNOLOGIES CORPORATION 8 Tokyo, Japan
HITACHI, LTD. 3 Tokyo, Japan
CANON KABUSHIKI KAISHA 3 Tokyo, Japan
Canon Inc. 2 Tokyo, Japan

Recent patent applications by YODA Haruo

Haruo YODA from Hinode, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2011-09-01

US20110210248A1

Electricity

CHARGED PARTICLE BEAM INSTRUMENT COMPRISING AN ABERRATION CORRECTOR

#2 | 2010-10-21

US20100264309A1

Electricity

Method for estimation of probe shape in charged particle beam instruments

#3 | 2010-04-01

US20100078556A1

Electricity

Electron Beam Apparatus And Method of Generating An Electron Beam Irradiation Pattern

#4 | 2010-04-01

US20100078555A1

Electricity

Electron beam apparatus and method of generating an electron beam irradiation pattern

#5 | 2007-08-23

US20070194236A1

Electricity

Semiconductor inspection system

#6 | 2007-06-26

US10082286

Semiconductor inspection system

#7 | 2007-03-15

US20070057200A1

Electricity

Electron beam apparatus and method of generating an electron beam irradiation pattern

#8 | 2006-05-02

US10613148

Exposure apparatus and exposure method

#9 | 2006-04-11

US10365383

Semiconductor inspection system

#10 | 2005-04-07

US20050072941A1

Electricity

Method of charged particle beam lithography and equipment for charged particle beam lithography

#11 | 2005-03-22

US10806190

Exposure apparatus

#12 | 2005-02-10

US20050029473A1

Electricity

Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus

InventorID:

3565803 ⎘