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Inventor profile of:

Yusuke Fuji

City:

Osaka

Country:

Japan

Published Applications:

Last publication date:

2010-12-23

Top Assignees for applications by Yusuke Fuji

The entities that hold a legal rights for patent applications filed by inventor Fuji Yusuke:

SUMITOMO CHEMICAL COMPANY, LIMITED 9 Tokyo, Japan
Sumitomo Chemical Company, Limited 1 Chuo-ku, Japan
SUMITOMO SEIKA CHEMICALS CO., LTD. 1 Hyogo, Japan
SUMITOMO CHEMICAL COMPANY, LIMITED 1 Osaka, Japan

Recent patent applications by Fuji Yusuke

Yusuke Fuji from Osaka, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2010-12-23

US20100323296A1

Chemistry; metallurgy

Resin and resist composition

#2 | 2010-11-04

US20100279226A1

Electricity

RESIST PROCESSING METHOD

#3 | 2010-10-28

US20100273112A1

Physics

PROCESS FOR PRODUCING PHOTORESIST PATTERN

#4 | 2010-08-12

US20100203446A1

Physics

CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN

#5 | 2010-07-01

US20100167199A1

Physics

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

#6 | 2009-12-24

US20090317744A1

Chemistry; metallurgy

Polymer and chemically amplified resist composition comprising the same

#7 | 2009-10-29

US20090269695A1

Physics

Chemically amplified positive resist composition

#8 | 2009-10-22

US20090264565A1

Chemistry; metallurgy

Polymer and chemically amplified resist composition comprising the same

#9 | 2009-10-22

US20090263742A1

Physics

Chemically amplified positive resist composition

#10 | 2009-09-03

US20090220890A1

Physics

Chemically amplified resist composition and chemically amplified resist composition for immersion lithography

#11 | 2007-03-29

US20070072120A1

Physics

Method for producing resin for chemically amplified positive resist

#12 | 2005-05-12

US20050100819A1

Physics

Chemical amplification type positive resist composition and a resin therefor

InventorID:

3638151 ⎘