Ralf Neubauer

City:

Bammental

Country:

Germany

Published Applications:

Last publication date:

2010-10-21

Top Assignees for applications by Ralf Neubauer

The entities that hold a legal rights for patent applications filed by inventor Neubauer Ralf:

Ralf Neubauer from Bammental, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Lithographic mask and method of forming a lithographic mask

InventorID:

3675970 ⎘