Hiroko SHIROGUCHI

City:

Atsugi

Country:

Japan

Published Applications:

Last publication date:

2013-01-03

Top Assignees for applications by Hiroko SHIROGUCHI

The entities that hold a legal rights for patent applications filed by inventor SHIROGUCHI Hiroko:

SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 6 Atsugi-shi, Japan
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 4 Kanagawa-ken, Japan
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 2 Atsugi-shi, Kanagawa-ken, Japan

Recent patent applications by SHIROGUCHI Hiroko

Hiroko SHIROGUCHI from Atsugi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2013-01-03

US20130001560A1

Physics

Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television

#2 | 2009-11-26

US20090291552A1

Physics

Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television

#3 | 2009-06-11

US20090148971A1

Electricity

Forming method of contact hole and manufacturing method of semiconductor device, liquid crystal display device and EL display device

#4 | 2005-09-08

US20050196710A1

Electricity

Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television apparatus

#5 | 2005-08-04

US20050170643A1

Electricity

Forming method of contact hole, and manufacturing method of semiconductor device, liquid crystal display device and EL display device

#6 | 2005-08-04

US20050170565A1

Electricity

Forming method of contact hole, and manufacturing method of semiconductor device, liquid crystal display device and EL display device

#7 | 2005-07-21

US20050158665A1

Physics

Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television

InventorID:

3742 ⎘