Thomas B. Faure

City:

Milton, Vermont

Country:

United States

Published Applications:

Last publication date:

2020-09-24

Top Assignees for applications by Thomas B. Faure

The entities that hold a legal rights for patent applications filed by inventor Faure Thomas B.:

Thomas B. Faure from Milton, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3

Techniques for reducing degradation and/or modifying feature size of photomasks

Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks

Method to etch chrome for photomask fabrication

Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks

CD uniformity of chrome etch to photomask process

InventorID:

3777871 ⎘