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Inventor profile of:

Pascal Meeus

City:

Turnhout

Country:

Belgium

Published Applications:

7

Last publication date:

2010-08-12

Top Assignees for applications by Pascal Meeus

The entities that hold a legal rights for patent applications filed by inventor Meeus Pascal:

  • AGFA-GEVAERT 5 Mortsel, Belgium
  • AGFA GRAPHICS NV 4 Mortsel, Belgium

Recent patent applications by Meeus Pascal

Pascal Meeus from Turnhout, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2010-08-12
US20100203458A1
Physics

Method for developing a printing plate precursor

#2 | 2008-09-04
US20080213696A1
Performing operations; transporting

Negative working, heat-sensitive, lithographic printing plate precursor

#3 | 2006-11-16
US20060257798A1
Physics

Alkaline developer for radiation sensitive compositions

#4 | 2006-11-16
US20060257789A1
Physics

Method for processing lithographic printing plates

#5 | 2006-01-19
US20060014104A1
Performing operations; transporting

Method for making a lithographic printing plate

#6 | 2006-01-19
US20060014103A1
Performing operations; transporting

Method for making a lithographic printing plate

#7 | 2005-05-19
US20050106510A1
Physics

Alkaline developer for radiation sensitive compositions

InventorID:

3819019 ⎘

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