Nicholas C. Fuller

City:

Ossining, New York

Country:

United States

Published Applications:

Last publication date:

2009-12-10

Top Assignees for applications by Nicholas C. Fuller

The entities that hold a legal rights for patent applications filed by inventor Fuller Nicholas C.:

INTERNATIONAL BUSINESS MACHINES CORPORATION 8 ARMONK, NY United States

Recent patent applications by Fuller Nicholas C.

Nicholas C. Fuller from Ossining, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2009-12-10

US20090305493A1

Electricity

Adopting feature of buried electrically conductive layer in dielectrics for electrical anti-fuse application

#2 | 2009-08-13

US20090200683A1

Electricity

INTERCONNECT STRUCTURES WITH PARTIALLY SELF ALIGNED VIAS AND METHODS TO PRODUCE SAME

#3 | 2009-04-23

US20090101985A1

Electricity

Trilayer resist scheme for gate etching applications

#4 | 2009-01-15

US20090014880A1

Electricity

DUAL DAMASCENE PROCESS FLOW ENABLING MINIMAL ULK FILM MODIFICATION AND ENHANCED STACK INTEGRITY

#5 | 2008-11-20

US20080283964A1

Electricity

Adopting feature of buried electrically conductive layer in dielectrics for electrical anti-fuse application

#6 | 2008-02-21

US20080045011A1

Electricity

Trilayer resist scheme for gate etching applications

#7 | 2007-07-12

US20070161226A1

Electricity

Dual damascene process flow enabling minimal ULK film modification and enhanced stack integrity

#8 | 2007-02-22

US20070040276A1

Electricity

Adopting feature of buried electrically conductive layer in dielectrics for electrical anti-fuse application

InventorID:

3855083 ⎘