Lagrangeville, New York
United States
8
2009-04-30
The entities that hold a legal rights for patent applications filed by inventor Faltermeier Johnathan E.:
Johnathan E. Faltermeier from Lagrangeville, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Uniform recess of a material in a trench independent of incoming topography
#2 | 2007-11-15Polysilicon hard mask for enhanced alignment signal
#3 | 2006-11-02STI formation in semiconductor device including SOI and bulk silicon regions
#4 | 2005-12-22STI formation in semiconductor device including SOI and bulk silicon regions
#5 | 2005-12-22Microelectronic element having trench capacitors with different capacitance values
#6 | 2005-05-17STI formation for vertical and planar transistors
#7 | 2005-04-14Self-aligned array contact for memory cells
#8 | 2005-01-20Method to improve bitline contact formation using a line mask
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