Wei Lu

City:

Poughkeepsie, New York

Country:

United States

Published Applications:

Last publication date:

2009-05-07

Top Assignees for applications by Wei Lu

The entities that hold a legal rights for patent applications filed by inventor Lu Wei:

Wei Lu from Poughkeepsie, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Dual carbon nanotubes for critical dimension metrology on high aspect ratio semiconductor wafer patterns

Method for electron beam-initiated coating for application of transmission electron microscopy

PT COATING INITIATED BY INDIRECT ELECTRON BEAM FOR RESIST CONTACT HOLE METROLOGY

High resolution cross-sectioning of polysilicon features with a dual beam tool

Metrology process for enhancing image contrast

InventorID:

3936883 ⎘