Hung-Wei Chen

BiCMOS performance enhancement by mechanical uniaxial strain and methods of manufacture

BiCMOS performance enhancement by mechanical uniaxial strain and methods of manufacture

MOS transistors with selectively strained channels

Dual metal silicides for lowering contact resistance

FIN-FET device structure formed employing bulk semiconductor substrate

Transistors with stressed channels

Diffusion topography engineering for high performance CMOS fabrication

Hybrid Schottky source-drain CMOS for high mobility and low barrier

Structure for a multiple-gate FET device and a method for its fabrication

FinFET split gate EEPROM structure and method of its fabrication

Capacitor-less 1T-DRAM cell with Schottky source and drain

Semiconductor structure and method for integrating SOI devices and bulk devices

Self-aligned gated p-i-n diode for ultra-fast switching

Method for manufacturing a semiconductor device with reduced floating body effect

CMOS logic gate fabricated on hybrid crystal orientations and method of forming thereof

Semiconductor nano-wire devices and methods of fabrication

Method for reducing a short channel effect for NMOS devices in SOI circuits

Semiconductor-on-insulator chip with<100>-oriented transistors