Inventor profile of:

Toshio Masuda

City:

Toride

Country:

Japan

Published Applications:

15

Last publication date:

2009-05-14

Top Assignees for applications by Toshio Masuda

The entities that hold a legal rights for patent applications filed by inventor Masuda Toshio:

Recent patent applications by Masuda Toshio

Toshio Masuda from Toride, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2009-05-14
US20090120580A1
Electricity

Disturbance-Free, Recipe-Controlled Plasma Processing System And Method

#2 | 2008-01-17
US20080011422A1
Electricity

Plasma processing system and apparatus and a sample processing method

#3 | 2007-08-23
US20070193687A1
Electricity

Disturbance-free, recipe-controlled plasma processing system and method

#4 | 2007-01-30
US10732285
-

Plasma processing system and apparatus and a sample processing method

#5 | 2006-12-12
US10779742
-

Plasma processing method

#6 | 2006-12-12
US10377826
-

Plasma processing apparatus and plasma processing method

#7 | 2006-09-21
US20060212156A1
Electricity

System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation

#8 | 2006-09-07
US20060199288A1
Electricity

Data processing apparatus for semiconductor processing apparatus

#9 | 2006-06-15
US20060124243A1
Electricity

Disturbance-free, recipe-controlled plasma processing system and method

#10 | 2006-06-13
US10434213
-

Maintenance method and system for plasma processing apparatus

#11 | 2006-05-23
US9414520
-

Plasma processing apparatus and a plasma processing method

#12 | 2005-08-02
US10732286
-

Plasma processing system and apparatus and a sample processing method

#13 | 2005-04-28
US20050087298A1
Electricity

Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor

#14 | 2005-04-19
US10350061
-

Disturbance-free, recipe-controlled plasma processing method

#15 | 2005-02-03
US20050022932A1
Electricity

Disturbance-free, recipe-controlled plasma processing system and method

InventorID:

3942636 ⎘