Uiwang-si
South Korea
3
2009-07-02
The entities that hold a legal rights for patent applications filed by inventor Kim Hye-Won:
Hye-Won Kim from Uiwang-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
(Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods
#2 | 2009-06-18Photosensitive polymer, resist composition, and associated methods
#3 | 2009-06-18Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods
3969635 ⎘