Toyama
Japan
15
2013-07-25
The entities that hold a legal rights for patent applications filed by inventor Takei Satoshi:
Satoshi Takei from Toyama, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
#2 | 2011-02-24Composition for forming resist underlayer film for lithography and production method of semiconductor device
#3 | 2010-01-28Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing
#4 | 2010-01-28Method for manufacturing semiconductor device using quadruple-layer laminate
#5 | 2009-12-17Resist underlayer film forming composition containing liquid additive
#6 | 2009-06-25Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
#7 | 2008-05-01Underlying coating forming composition for lithography containing compound having protected carboxyl group
#8 | 2007-12-20Underlayer coating forming composition for lithography containing cyclodextrin compound
#9 | 2007-10-11Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom
#10 | 2007-06-28Composition for forming nitride coating film for hard mask
#11 | 2007-06-14Underlayer coating forming composition containing dextrin ester compound
#12 | 2006-09-21Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating
#13 | 2006-09-21Underlayer coating forming composition for lithography containing compound having protected carboxyl group
#14 | 2006-03-30Acrylic polymer-containing gap fill material forming composition for lithography
#15 | 2006-02-23Alkali-soluble gap fill material forming composition for lithography
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