Daisuke Sakuma

City:

Funabashi-shi

Country:

Japan

Published Applications:

Last publication date:

2015-11-12

Top Assignees for applications by Daisuke Sakuma

The entities that hold a legal rights for patent applications filed by inventor Sakuma Daisuke:

NISSAN CHEMICAL INDUSTRIES, LTD. 5 Tokyo, Japan

Recent patent applications by Sakuma Daisuke

Daisuke Sakuma from Funabashi-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-11-12

US20150322212A1

Chemistry; metallurgy

Composition for forming silicon-containing resist underlayer film having cyclic diester group

#2 | 2014-12-18

US20140370182A1

Chemistry; metallurgy

Organic silicon compound and silane coupling agent containing the same

#3 | 2014-06-19

US20140170855A1

Electricity

Silicon-containing resist underlayer film-forming composition having sulfone structure

#4 | 2013-11-14

US20130302991A1

Electricity

Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group

#5 | 2013-08-22

US20130216956A1

Physics

Monolayer or multilayer forming composition

InventorID:

401832 ⎘