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Inventor profile of:

Eri Tsukada

City:

Ibaraki

Country:

Japan

Published Applications:

4

Last publication date:

2009-09-17

Top Assignees for applications by Eri Tsukada

The entities that hold a legal rights for patent applications filed by inventor Tsukada Eri:

  • L'Air Liquide Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude 1 Paris, France
  • L'Air Liquide, Société Anonyme á Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés Georges Claude 1 Paris, France

Recent patent applications by Tsukada Eri

Eri Tsukada from Ibaraki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2009-09-17
US20090232985A1
Electricity

Method of forming silicon oxide containing films

#2 | 2007-08-16
US20070190807A1
Chemistry; metallurgy

Method for forming dielectric or metallic films

#3 | 2007-07-12
US20070160774A1
Chemistry; metallurgy

Method for producing silicon nitride films and silicon oxynitride films by chemical vapor deposition

#4 | 2005-03-03
US20050048204A1
Chemistry; metallurgy

Method for the fabrication of silicon nitride, silicon oxynitride, and silicon oxide films by chemical vapor deposition

InventorID:

4026263 ⎘

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