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Inventor profile of:

Mitsuhiro Hata

City:

Gyeonggi-do

Country:

South Korea

Published Applications:

7

Last publication date:

2009-10-22

Top Assignees for applications by Mitsuhiro Hata

The entities that hold a legal rights for patent applications filed by inventor Hata Mitsuhiro:

  • SAMSUNG ELECTRONICS CO., LTD. 2 Gyeonggi-Do, South Korea
  • Samsung Electronics Co., Ltd 2 , South Korea

Recent patent applications by Hata Mitsuhiro

Mitsuhiro Hata from Gyeonggi-do, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2009-10-22
US20090263732A1
Physics

Mask patterns including gel layers for semiconductor device fabrication

#2 | 2008-07-24
US20080176152A1
Electricity

Mask patterns for semiconductor device fabrication and related methods and structures

#3 | 2006-12-07
US20060275697A1
Physics

Top coating composition for photoresist and method of forming photoresist pattern using the same

#4 | 2006-06-15
US20060127816A1
Physics

Double photolithography methods with reduced intermixing of solvents

#5 | 2006-05-25
US20060111550A1
Physics

Top coating composition for photoresist and method of forming photoresist pattern using same

#6 | 2006-03-23
US20060063384A1
Electricity

Mask patterns for semiconductor device fabrication and related methods

#7 | 2006-03-23
US20060063077A1
Physics

Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same

InventorID:

4047111 ⎘

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