Alessandro Spandre

City:

Pavia

Country:

Italy

Published Applications:

Last publication date:

2008-01-03

Top Assignees for applications by Alessandro Spandre

The entities that hold a legal rights for patent applications filed by inventor Spandre Alessandro:

Alessandro Spandre from Pavia, IT has applied for patents for these inventions. The list has both pending applications and granted patents:

METHOD FOR REDUCING DEFECTS AFTER A METAL ETCHING IN SEMICONDUCTOR DEVICES

Method for patterning on a wafer having at least one substrate for the realization of an integrated circuit

Method for reducing defects after a metal etching in semiconductor devices

Process for forming tapered trenches in a dielectric material

Process for defining a chalcogenide material layer, in particular in a process for manufacturing phase change memory cells

InventorID:

4085402 ⎘