Gernot Biese

City:

Marzling

Country:

Germany

Published Applications:

Last publication date:

2023-06-01

Top Assignees for applications by Gernot Biese

The entities that hold a legal rights for patent applications filed by inventor Biese Gernot:

Gernot Biese from Marzling, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

PROCESS FOR REDUCING PATTERN-INDUCED WAFER DEFORMATION

Reduced pattern-induced wafer deformation

Method of processing semiconductor wafers

METHOD FOR IN-LINE MONITORING A LENS CONTROLLER OF A PHOTOLITHOGRAPHY SYSTEM

InventorID:

4086112 ⎘