Jericho, Vermont
United States
16
2008-10-16
The entities that hold a legal rights for patent applications filed by inventor Cooney Edward C.:
Edward C. Cooney from Jericho, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Reducing effective dielectric constant in semiconductor devices
#2 | 2008-08-28SACRIFICIAL METAL SPACER DUAL DAMASCENE
#3 | 2008-02-14Device and methodology for reducing effective dielectric constant in semiconductor devices
#4 | 2008-02-14Device and methodology for reducing effective dielectric constant in semiconductor devices
#5 | 2008-01-24Process for interfacial adhesion in laminate structures through patterned roughing of a surface
#6 | 2008-01-24Copper Alloy Via Bottom Liner
#7 | 2007-11-29FULL REMOVAL OF DUAL DAMASCENE METAL LEVEL
#8 | 2007-07-05Metal seed layer deposition
#9 | 2006-02-09Exposed pore sealing post patterning
#10 | 2005-12-15Process for interfacial adhesion in laminate structures through patterned roughing of a surface
#11 | 2005-12-01Exposed pore sealing post patterning
#12 | 2005-11-17Metal seed layer deposition
#13 | 2005-11-03Method and apparatus for selectively altering dielectric properties of localized semiconductor device regions
#14 | 2005-08-04Device and methodology for reducing effective dielectric constant in semiconductor devices
#15 | 2005-07-07Metal spacer in single and dual damascence processing
#16 | 2005-04-21Sacrificial metal spacer damascene process
4101743 ⎘