Palm Harbor, Florida
United States
17
2008-06-26
The entities that hold a legal rights for patent applications filed by inventor Johnson David:
David Johnson from Palm Harbor, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Temperature control method for photolithographic substrate
#2 | 2008-03-13Method for plasma etching of positively sloped structures
#3 | 2008-02-14Method to minimize CD etch bias
#4 | 2007-09-20Apparatus and Method for Carrying Substrates
#5 | 2007-08-02Notch-Free Etching of High Aspect SOI Structures Using A Time Division Multiplex Process and RF Bias Modulation
#6 | 2007-02-22Optical emission interferometry for PECVD using a gas injection hole
#7 | 2006-10-03Method and apparatus for process control in time division multiplexed (TDM) etch process
#8 | 2006-09-05Envelope follower end point detection in time division multiplexed processes
#9 | 2006-04-06Method and apparatus to improve plasma etch uniformity
#10 | 2006-01-12Selection of wavelengths for end point in a time division multiplexed process
#11 | 2006-01-03End point detection in time division multiplexed etch processes
#12 | 2005-12-29Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes
#13 | 2005-12-01Method and apparatus for process control in time division multiplexed (TDM) etch processes
#14 | 2005-08-02Sidewall smoothing in high aspect ratio/deep etching using a discrete gas switching method
#15 | 2005-06-14Notch-free etching of high aspect SOI structures using alternating deposition and etching and pulsed plasma
#16 | 2005-05-26Notch-free etching of high aspect SOI structures using a time division multiplex process and RF bias modulation
#17 | 2005-01-25Method for etching vias
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