Thomas H. Baum

City:

Fairfield, Connecticut

Country:

United States

Published Applications:

Last publication date:

2008-03-13

Recent patent applications by Baum Thomas H.

Thomas H. Baum from Fairfield, US has applied for patents for these inventions. The list has both pending applications and granted patents:

SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES

REMOVAL OF HIGH-DOSE ION-IMPLANTED PHOTORESIST USING SELF-ASSEMBLED MONOLAYERS IN SOLVENT SYSTEMS

InventorID:

4137784 ⎘