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Inventor profile of:

Hidemitsu AOKI

City:

Kanagawa

Country:

Japan

Published Applications:

Last publication date:

2010-03-30

Top Assignees for applications by Hidemitsu AOKI

The entities that hold a legal rights for patent applications filed by inventor AOKI Hidemitsu:

NEC ELECTRONICS CORPORATION 16 Kanagawa, Japan
Kanto Kagaku Kabushiki Kaisha 5 Tokyo, Japan
NEC Electronics Corporation 2 , Japan
RENESAS ELECTRONICS CORPORATION 2 Kanagawa, Japan
NEC Corporation 2 Tokyo, Japan
Kanto Kagaku Kabushiki Kaisha 1 Kawasaki, Kanagawa, Japan
NEC Electronics Corporation 1 Kawasaki, Kanagawa, Japan
NEC ELETRONICS CORPORATION 1 Kanagawa, Japan
Kanto Kagaku Kabushiki Kaisha 1 Kanagawa, Japan

Recent patent applications by AOKI Hidemitsu

Hidemitsu AOKI from Kanagawa, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2010-03-30

US10740813

Semiconductor device and method for manufacturing same

#2 | 2008-10-28

US10357087

Method for removing contamination and method for fabricating semiconductor device

#3 | 2008-10-09

US20080248651A1

Electricity

Method for manufacturing semiconductor device and semiconductor device

#4 | 2008-09-04

US20080214002A1

Electricity

Manufacturing method for semiconductor device

#5 | 2008-04-03

US20080081445A1

Electricity

Method of forming a high-k film on a semiconductor device

#6 | 2008-03-20

US20080066779A1

Electricity

Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device

#7 | 2007-12-25

US10350185

Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device

#8 | 2007-03-20

US10854306

Method of forming a high-k film on a semiconductor device

#9 | 2007-01-30

US10318199

Semiconductor device having a roughened surface

#10 | 2007-01-18

US20070015351A1

Electricity

Process for making a semiconductor device having a roughened surface

#11 | 2006-11-21

US10369877

Washing liquid composition for semiconductor substrate

#12 | 2006-10-19

US20060234513A1

Electricity

Method for manufacturing semiconductor device and semiconductor device

#13 | 2006-08-08

US10685571

Method for manufacturing semiconductor device and semiconductor device

#14 | 2006-08-08

US10435165

Post-CMP washing liquid composition

#15 | 2006-04-20

US20060081180A1

Electricity

Substrate processing apparatus

#16 | 2005-10-27

US20050236362A1

Electricity

Cleaning solution and manufacturing method for semiconductor device

#17 | 2005-09-27

US10614971

Preparation process for semiconductor device

#18 | 2005-07-21

US20050156140A1

Chemistry; metallurgy

Tungsten metal removing solution and method for removing tungsten metal by use thereof

#19 | 2005-05-10

US10680216

Method of manufacturing semiconductor device and apparatus for cleaning substrate

#20 | 2005-05-10

US10339658

Semiconductor device fabricating method and treating liquid

#21 | 2005-04-12

US10309132

Chemical solution treatment apparatus for semiconductor substrate

InventorID:

4139791 ⎘