Axel Feicke

City:

Chemnitz

Country:

Germany

Published Applications:

Last publication date:

2008-05-01

Top Assignees for applications by Axel Feicke

The entities that hold a legal rights for patent applications filed by inventor Feicke Axel:

Axel Feicke from Chemnitz, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate

InventorID:

4166467 ⎘