Hsinchu
Taiwan
7
2021-09-09
The entities that hold a legal rights for patent applications filed by inventor Pan Shing-Chyang:
Shing-Chyang Pan from Hsinchu, TW has applied for patents for these inventions. The list has both pending applications and granted patents:
Metal-based etch-stop layer
#2 | 2020-02-27Metal-based etch-stop layer
#3 | 2019-10-31Metal-based etch-stop layer
#4 | 2018-06-07Systems and methods for integrated resputtering in a physical vapor deposition chamber
#5 | 2015-07-23Systems and methods for integrated resputtering in a physical vapor deposition chamber
#6 | 2008-08-21System and method for film stress and curvature gradient mapping for screening problematic wafers
#7 | 2005-03-10Method for simultaneous degas and baking in copper damascene process
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