Aalen
Germany
14
2008-09-18
The entities that hold a legal rights for patent applications filed by inventor Schultz Jorg:
Jorg Schultz from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
ILLUMINATION SYSTEM WITH VARIABLE ADJUSTMENT OF THE ILLUMINATION
#2 | 2008-02-12EUV illumination system having a plurality of light sources for illuminating an optical element
#3 | 2007-02-08Illumination system with field mirrors for producing uniform scanning energy
#4 | 2007-01-18Reticle-masking objective with aspherical lenses
#5 | 2006-12-12Illumination system, particularly for EUV lithography
#6 | 2006-11-02Illumination system particularly for microlithography
#7 | 2006-10-31Reticle-masking objective with aspherical lenses
#8 | 2006-10-24Illumination system with field mirrors for producing uniform scanning energy
#9 | 2006-07-04Illumination system with a plurality of light sources
#10 | 2006-02-28Illumination system particularly for microlithography
#11 | 2005-04-21Multi mirror system for an illumination system
#12 | 2005-02-22Illumination system particularly for microlithography
#13 | 2005-02-22Illumination system, particularly for EUV lithography
#14 | 2005-01-11Multi mirror system for an illumination system
4254656 ⎘