Munich
Germany
12
2009-05-21
The entities that hold a legal rights for patent applications filed by inventor Balster Scott:
Scott Balster from Munich, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Advanced CMOS using super steep retrograde wells
#2 | 2008-10-30Integrated stacked capacitor and method of fabricating same
#3 | 2006-10-31Stacked capacitor and method for fabricating same
#4 | 2006-08-10Advanced CMOS using super steep retrograde wells
#5 | 2006-06-20Advanced CMOS using super steep retrograde wells
#6 | 2005-11-24On chip heating for electrical trimming of polysilicon and polysilicon-silicon-germanium resistors and electrically programmable fuses for integrated circuits
#7 | 2005-10-25On chip heating for electrical trimming of polysilicon and polysilicon-silicon-germanium resistors and electrically programmable fuses for integrated circuits
#8 | 2005-05-12Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer
#9 | 2005-03-10Method of producing complementary SiGe bipolar transistors
#10 | 2005-01-20Method of fabricating complementary bipolar transistors with SiGe base regions
#11 | 2005-01-13Integrated stacked capacitor and method of fabricating same
#12 | 2005-01-06Method of fabricating an integrated silicon-germanium heterobipolar transistor and an integrated silicon-germanium heterobipolar transistor
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