Christopher K. Magg

City:

Jericho, Vermont

Country:

United States

Published Applications:

Last publication date:

2008-10-30

Top Assignees for applications by Christopher K. Magg

The entities that hold a legal rights for patent applications filed by inventor Magg Christopher K.:

INTERNATIONAL BUSINESS MACHINES CORPORATION 3 ARMONK, NY United States

Recent patent applications by Magg Christopher K.

Christopher K. Magg from Jericho, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2008-10-30

US20080270059A1

Physics

Mask inspection DNIR replacement based on location of tri-tone level database images—2P shapes

#2 | 2007-03-01

US20070050163A1

Physics

Mask inspection DNIR placement based on location of tri-tone level database images (2P shapes)

#3 | 2006-05-04

US20060093924A1

Physics

Method for correction of defects in lithography masks

InventorID:

4285251 ⎘