Phoenix, Arizona
United States
5
2008-11-20
The entities that hold a legal rights for patent applications filed by inventor Pomarede Christophe:
Christophe Pomarede from Phoenix, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Incorporation of nitrogen into high k dielectric film
#2 | 2006-09-21Silicon oxide cap over high dielectric constant films
#3 | 2006-04-04Reduced cross-contamination between chambers in a semiconductor processing tool
#4 | 2005-11-01Incorporation of nitrogen into high k dielectric film
#5 | 2005-09-29Incorporation of nitrogen into high k dielectric film
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