Mark van Dal

Semiconductor device and formation thereof

Semiconductor device and formation thereof

Semiconductor device and method including an intertial mass element

Structure and method for defect passivation to reduce junction leakage for finfet device

III-V compound semiconductor device having dopant layer and method of making the same

Semiconductor device and formation thereof

Semiconductor device and formation thereof

Epitaxially Growing III-V Contact Plugs for MOSFETs

MOSFETs with channels on nothing and methods for forming the same

Ditches near semiconductor fins and methods for forming the same

Barrier layer for FinFET channels

FinFET with channel backside passivation layer device and method

Structure and method for defect passivation to reduce junction leakage for finFET device

Faceted finFET

Device with a strained Fin

Fin field effect transistor layout for stress optimization

III-V COMPOUND SEMICONDUCTOR DEVICE HAVING DOPANT LAYER AND METHOD OF MAKING THE SAME

MOSFETs with channels on nothing and methods for forming the same

FinFET with a buried semiconductor material between two fins

Nickelide source/drain structures for CMOS transistors

Strained channel field effect transistor

Mask-less and implant free formation of complementary tunnel field effect transistors

Method of fabricating a semiconductor device having an epitaxy region

Method of fabricating a semiconductor device having an epitaxy region

SELF-ALIGNED IMPACT-IONIZATION FIELD EFFECT TRANSISTOR

Double patterning for lithography to increase feature spatial density

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE WITH DIFFERENT METALLIC GATES

Double-gate semiconductor devices having gates with different work functions and methods of manufacture thereof

Source and Drain Formation in Silicon on Insulator Device

Method of Manufacturing a Semiconductor Device and Semiconductor Device Obtained With Such a Method