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Inventor profile of:

Mark Doczy

City:

Meridian, Idaho

Country:

United States

Published Applications:

1

Last publication date:

2008-12-18

Recent patent applications by Doczy Mark

Mark Doczy from Meridian, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2008-12-18

US20080311762A1

Semiconductor device surface roughness reduction

InventorID:

4312939 ⎘