Mountain View, California
United States
8
2007-08-23
The entities that hold a legal rights for patent applications filed by inventor Abrams Daniel S.:
Daniel S. Abrams from Mountain View, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Mask-patterns including intentional breaks
#2 | 2007-08-09Mask-pattern determination using topology types
#3 | 2007-08-09System, masks, and methods for photomasks optimized with approximate and accurate merit functions
#4 | 2007-08-09Lithography verification using guard bands
#5 | 2007-08-09Systems, masks, and methods for photolithography
#6 | 2007-01-11Fast systems and methods for calculating electromagnetic fields near photomasks
#7 | 2007-01-11Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern
#8 | 2006-08-03Systems, masks and methods for printing contact holes and other patterns
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