Palo Alto, California
United States
6
2007-08-16
The entities that hold a legal rights for patent applications filed by inventor Abrams Daniel:
Daniel Abrams from Palo Alto, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for time-evolving rectilinear contours representing photo masks
#2 | 2007-06-14Technique for determining a mask pattern corresponding to a photo-mask
#3 | 2007-01-11Optimized photomasks for photolithography
#4 | 2007-01-11Method for time-evolving rectilinear contours representing photo masks
#5 | 2007-01-11Optimized photomasks for photolithography
#6 | 2006-10-17Method for time-evolving rectilinear contours representing photo masks
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