Sandy Hook, Connecticut
United States
93
2023-02-23
The entities that hold a legal rights for patent applications filed by inventor Rodbell Kenneth P.:
Kenneth P. Rodbell from Sandy Hook, US has applied for patents for these inventions. The list has both pending applications and granted patents:
FORMATION OF AN EPITAXIAL BARRIER BETWEEN A SEMICONDUCTOR SUBSTRATE AND A METAL RESONATOR FOR IMPROVED SUBSTRATE METAL PARTICIPATION
#2 | 2022-10-06Evaluation of wafer carcass alpha particle emission
#3 | 2022-06-09Qubits with ion implant Josephson junctions
#4 | 2022-04-21Sacrificial material facilitating protection of a substrate in a qubit device
#5 | 2022-02-03Lithography for fabricating Josephson junctions
#6 | 2021-09-30Reducing error rates with alpha particle protection
#7 | 2021-08-19Integrated reactive material erasure element with phase change memory
#8 | 2019-10-10Heterogeneous miniaturization platform
#9 | 2019-09-26Measuring flux, current, or integrated charge of low energy particles
#10 | 2019-07-11Fragmenting computer chips
#11 | 2019-03-28Thin film interconnects with large grains
#12 | 2019-01-24Energy release using tunable reactive materials
#13 | 2019-01-10Real time X-ray dosimeter using diodes with variable thickness degrader
#14 | 2019-01-10Real time X-ray dosimeter using diodes with variable thickness degrader
#15 | 2018-07-19Measuring flux, current, or integrated charge of low energy particles
#16 | 2018-04-26Heterogeneous miniaturization platform
#17 | 2018-04-05Fragmenting computer chips
#18 | 2018-03-22Chemically strengthened glass and methods of making same
#19 | 2018-03-01Activating reactions in integrated circuits through electrical discharge
#20 | 2018-02-15Damaging integrated circuit components
#21 | 2018-01-04Damaging integrated circuit components
#22 | 2017-11-16Tamper-proof electronic packages formed with stressed glass
#23 | 2017-11-16Tamper-proof electronic packages with stressed glass component substrate(s)
#24 | 2017-09-14Sensors including complementary lateral bipolar junction transistors
#25 | 2017-08-15Heterogeneous miniaturization platform
#26 | 2017-08-10Integrated arming switch and arming switch activation layer for secure memory
#27 | 2017-08-10Energy release using tunable reactive materials
#28 | 2017-07-20Chemically strengthened glass and methods of making same
#29 | 2017-07-20Chemically strengthened glass and methods of making same
#30 | 2017-07-20Chemically strengthened glass and methods of making same
#31 | 2017-04-20Sensors including complementary lateral bipolar junction transistors
#32 | 2017-03-30Integrated reactive material erasure element with phase change memory
#33 | 2016-10-27Preventing unauthorized use of integrated circuits for radiation-hard applications
#34 | 2016-10-13Activating reactions in integrated circuits through electrical discharge
#35 | 2016-09-15Controlling fragmentation of chemically strengthened glass
#36 | 2016-07-26Preventing unauthorized use of integrated circuits for radiation-hard applications
#37 | 2016-06-09Activating reactions in integrated circuits through electrical discharge
#38 | 2016-05-19Controlling fragmentation of chemically strengthened glass
#39 | 2016-05-12Activating reactions in integrated circuits through electrical discharge
#40 | 2016-03-03Boron rich nitride cap for total ionizing dose mitigation in SOI devices
#41 | 2015-12-03Thin film interconnects with large grains
#42 | 2015-08-27Boron rich nitride cap for total ionizing dose mitigation in SOI devices
#43 | 2015-06-18Formation of alpha particle shields in chip packaging
#44 | 2015-03-26Integrated circuits with radioactive source material and radiation detection
#45 | 2015-01-01Method of consumer/producer raw material selection
#46 | 2014-11-06Fabricating a small-scale radiation detector
#47 | 2014-09-11Method for conversion of commercial microprocessor to radiation-hardened processor and resulting processor
#48 | 2014-05-08Microstructure modification in copper interconnect structures
#49 | 2014-04-17Reactive material for integrated circuit tamper detection and response
#50 | 2014-04-17Multi-doped silicon antifuse device for integrated circuit
#51 | 2014-04-17Integrated circuit tamper detection and response
#52 | 2013-10-31MICROSTRUCTURE MODIFICATION IN COPPER INTERCONNECT STRUCTURES
#53 | 2013-03-14Microstructure modification in copper interconnect structures
#54 | 2013-03-14Tunable radiation source
#55 | 2013-02-28On-chip radiation dosimeter
#56 | 2013-01-31Fully depleted silicon on insulator neutron detector
#57 | 2013-01-29On-chip radiation dosimeter
#58 | 2013-01-03METHOD AND STRUCTURE OF FORMING SILICIDE AND DIFFUSION BARRIER LAYER WITH DIRECT DEPOSITED FILM ON SI
#59 | 2012-10-25Formation of alpha particle shields in chip packaging
#60 | 2012-06-28Ionizing radiation blocking in IC chip to reduce soft errors
#61 | 2012-02-02Alpha particle blocking wire structure and method fabricating same
#62 | 2011-12-22Method and structure of forming silicide and diffusion barrier layer with direct deposited film on silicon
#63 | 2011-04-14METHOD FOR CONVERSION OF COMMERCIAL MICROPROCESSOR TO RADIATION-HARDENED PROCESSOR AND RESULTING PROCESSOR
#64 | 2010-12-23Microstructure modification in copper interconnect structure
#65 | 2009-12-24Silicide interconnect structure
#66 | 2009-09-24Discrete placement of radiation sources on integrated circuit devices
#67 | 2009-08-20Microstructure modification in copper interconnect structure
#68 | 2009-04-30RADIATION DETECTION SCHEMES, APPARATUS AND METHODS OF TRANSMITTING RADIATION DETECTION INFORMATION TO A NETWORK
#69 | 2009-03-12Method and structures for accelerated soft-error testing
#70 | 2009-03-05CMOS storage devices configurable in high performance mode or radiation tolerant mode
#71 | 2009-02-12Ionizing radiation blocking in IC chip to reduce soft errors
#72 | 2008-12-25Formation of alpha particle shields in chip packaging
#73 | 2008-12-18High temperature processing compatible metal gate electrode for pFETS and methods for fabrication
#74 | 2008-12-18Method of detecting and transmitting radiation detection information to a network
#75 | 2008-12-04STABILIZATION OF Ni MONOSILICIDE THIN FILMS IN CMOS DEVICES USING IMPLANTATION OF IONS BEFORE SILICIDATION
#76 | 2008-09-18Static random access memory cell with improved stability
#77 | 2008-09-04Method and structure for reducing contact resistance between silicide contact and overlying metallization
#78 | 2008-07-10Method for reduction of soft error rates in integrated circuits
#79 | 2008-07-03Homogeneous Copper Interconnects for BEOL
#80 | 2007-11-29Method and structure for reducing contact resistance between silicide contact and overlying metallization
#81 | 2007-10-25Static random access memory cell with improved stability
#82 | 2007-03-01Alpha particle shields in chip packaging
#83 | 2007-02-22Stabilization of Ni monosilicide thin films in CMOS devices using implantation of ions before silicidation
#84 | 2007-01-18Method and structure for reduction of soft error rates in integrated circuits
#85 | 2006-04-06Homogeneous Copper Interconnects for BEOL
#86 | 2006-01-24Polishing pads with polymer filled fibrous web, and methods for fabricating and using same
#87 | 2006-01-10Optimization of storage and power consumption with soft error predictor-corrector
#88 | 2005-12-27Method for plating copper conductors and devices formed
#89 | 2005-12-13Method for electroplating on resistive substrates
#90 | 2005-11-10Stabilization of Ni monosilicide thin films in CMOS devices using implantation of ions before silicidation
#91 | 2005-09-15Method for electroplating on resistive substrates
#92 | 2005-06-30Automatic exchange of degraders in accelerated testing of computer chips
#93 | 2005-06-21Method and apparatus for thin film thickness mapping
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