🔗 Permalink

Inventor profile of:

Ch Yang

City:

Shanghai

Country:

China

Published Applications:

1

Last publication date:

2007-02-08

Recent patent applications by Yang Ch

Ch Yang from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2007-02-08

US20070031596A1

Chemistry; metallurgy

Method for reducing particle contamination in a low pressure CVD apparatus

InventorID:

4352035 ⎘