Guenter Hess

City:

Meiningen

Country:

Germany

Published Applications:

Last publication date:

2007-04-05

Recent patent applications by Hess Guenter

Guenter Hess from Meiningen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Attenuated phase shift mask blank and photomask

Method of producing a mask blank for photolithographic applications, and mask blank

Method for manufacturing of a mask blank for EUV photolithography and mask blank

Mask blank having a protection layer

Method and apparatus for removing an edge region of a layer applied to a substrate and for coating a substrate and a substrate

InventorID:

4387433 ⎘